Surface modification of Ti implants by plasma oxidation in hollow cathode discharge
Surface modification of Ti implants by plasma oxidation in hollow cathode discharge
Received 15 June 2004; accepted 31 December 2004. Available online 18 March 2005.
M.A.M. Silva, A.E. Martinelli, , C. Alves, Jr., R.M. Nascimento, M.P. T??vora and C.D. Vilar
Surface and Coatings Technology
ScienceDirect
Universidade Federal do Rio Grande do Norte, Centro de Tecnologia, Programa de P??s-gradua???Ło em Engenharia Mec?˘nica, Campus Universit??rio Lagoa Nova s/n, Natal, RN 59072-970, Brazil
Abstract
As a result of superior biocompatibility and mechanical adequacy, titanium has been widely used in the manufacture of dental implants. On the downside, relatively long periods are normally required to fully integration of the bone into the implant. Surface modification techniques have the potential to shorten the osseointegration time of implants significantly contributing to patient comfort. In this work, plasma discharge in oxidizing atmospheres was used to modify the surface of Ti implants by the production of rough surfaces that consists of a mixture of Ti-oxides. The results showed that considerable improvement on surface roughness and mechanical stability of the oxidized layers could be achieved by confining the effect of the plasma discharge by shielding the cathodic region of the reactor. Processing parameters including temperature, time and pressure were optimized and applied to commercially available Ti implants. Improved wetting was obtained, which is potentially associated to shorter osseointegration periods.
Keywords: D. Titanium; A. Titanium oxide; C. DC plasma; B. Roughness; X. Surface modification
This is a subscription site. You will need to register and pay to view the full text article.



Votes:34